Publication:
3D sequential low temperature top tier devices using dopant activation with excimer laser anneal and strained silicon as performance boosters
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1976 since deposited on 2021-11-02
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Acq. date: 2026-03-18
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Statistics
Views
1976 since deposited on 2021-11-02
2last month
2last week
Acq. date: 2026-03-18
Citations