Show simple item record

High sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualification

dc.contributor.authorCross, Andrew
dc.contributor.authorSah, Kaushik
dc.contributor.authorAnantha, Vidyasagar
dc.contributor.authorGupta, Balarka
dc.contributor.authorYnzunza, Ramon
dc.contributor.authorTroy, Neil
dc.contributor.authorWu, Kenong
dc.contributor.authorBabulnath, Raghav
dc.contributor.authorRajendran, Meghna
dc.contributor.authorVan den Heuvel, Dieter
dc.contributor.authorLeray, Philippe
dc.date.accessioned2022-01-27T16:58:44Z
dc.date.available2021-11-02T16:03:40Z
dc.date.available2022-01-27T16:58:44Z
dc.date.issued2020
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000632585900009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38080.2
dc.sourceWOS
dc.titleHigh sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualification
dc.typeProceedings paper
dc.contributor.imecauthorVan den Heuvel, Dieter
dc.contributor.imecauthorLeray, Philippe
dc.identifier.doi10.1117/12.2572912
dc.identifier.eisbn978-1-5106-3843-3
dc.source.numberofpages8
dc.source.peerreviewyes
dc.source.beginpage11517OU
dc.source.conferenceConference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 21-25, 2020
dc.source.conferencelocationVirtual
dc.source.journalProceedings of SPIE
dc.source.volume11517
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record

Version history

VersionItemDateSummary
220.500.12860/38080.2*2022-01-27T10:15:04Zvalidation by library/open access desk
120.500.12860/380802021-11-02T16:03:40Z

*Selected version