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High sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualification
dc.contributor.author | Cross, Andrew | |
dc.contributor.author | Sah, Kaushik | |
dc.contributor.author | Anantha, Vidyasagar | |
dc.contributor.author | Gupta, Balarka | |
dc.contributor.author | Ynzunza, Ramon | |
dc.contributor.author | Troy, Neil | |
dc.contributor.author | Wu, Kenong | |
dc.contributor.author | Babulnath, Raghav | |
dc.contributor.author | Rajendran, Meghna | |
dc.contributor.author | Van den Heuvel, Dieter | |
dc.contributor.author | Leray, Philippe | |
dc.date.accessioned | 2021-11-02T16:03:40Z | |
dc.date.available | 2021-11-02T16:03:40Z | |
dc.date.issued | 2020 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000632585900009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/38080 | |
dc.source | WOS | |
dc.title | High sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualification | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Van den Heuvel, Dieter | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.identifier.doi | 10.1117/12.2572912 | |
dc.identifier.eisbn | 978-1-5106-3843-3 | |
dc.source.numberofpages | 8 | |
dc.source.peerreview | yes | |
dc.source.conference | Conference on Extreme Ultraviolet Lithography | |
dc.source.conferencedate | SEP 21-25, 2020 | |
dc.source.volume | 11517 | |
imec.availability | Under review |
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