Publication:
Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration
Loading...
Journal
Abstract
Description
Metrics
Downloads
246 since deposited on 2021-11-02
25last month
6last week
Acq. date: 2026-01-07
Views
1937 since deposited on 2021-11-02
Acq. date: 2026-01-07
Citations
Metrics
Downloads
246 since deposited on 2021-11-02
25last month
6last week
Acq. date: 2026-01-07
Views
1937 since deposited on 2021-11-02
Acq. date: 2026-01-07
Citations