Publication:
Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration
Loading...
Journal
Abstract
Description
Statistics
Downloads
364 since deposited on 2021-11-02
27last month
4last week
Acq. date: 2026-05-04
Views
1940 since deposited on 2021-11-02
Acq. date: 2026-05-04
Citations
Statistics
Downloads
364 since deposited on 2021-11-02
27last month
4last week
Acq. date: 2026-05-04
Views
1940 since deposited on 2021-11-02
Acq. date: 2026-05-04
Citations