Publication:
Alleviation of Negative-Bias Temperature Instability in Si p-FinFETs With ALD W Gate-Filling Metal by Annealing Process Optimization
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609 since deposited on 2021-11-02
Acq. date: 2026-06-12
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1665 since deposited on 2021-11-02
Acq. date: 2026-06-12
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Downloads
609 since deposited on 2021-11-02
Acq. date: 2026-06-12
Views
1665 since deposited on 2021-11-02
Acq. date: 2026-06-12
Citations