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Using Unsupervised Machine Learning for Plasma Etching Endpoint Detection
Publication:
Using Unsupervised Machine Learning for Plasma Etching Endpoint Detection
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Date
2020
Proceedings Paper
https://doi.org/10.5220/0008877502730279
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Chakroun, Imen
;
Ashby, Tom
;
Das, Sayantan
;
Halder, Sandip
;
Wuyts, Roel
;
Verachtert, Wilfried
Journal
na
Abstract
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1101
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Acq. date: 2025-12-17
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1883
since deposited on 2021-11-02
Acq. date: 2025-12-17
Citations
Metrics
Downloads
1101
since deposited on 2021-11-02
67
last month
17
last week
Acq. date: 2025-12-17
Views
1883
since deposited on 2021-11-02
Acq. date: 2025-12-17
Citations