Publication:
Area-Selective Atomic Layer Deposition of TiN Using Trimethoxy(octadecyl)silane as a Passivation Layer
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1949 since deposited on 2021-11-02
1last month
Acq. date: 2026-02-25
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Statistics
Views
1949 since deposited on 2021-11-02
1last month
Acq. date: 2026-02-25
Citations