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Surface Chemistry and Nanoscale Wet Etching of Group IV Semiconductors in Acidic H2O2 Solutions

dc.contributor.authorlebedev, Mikhail
dc.contributor.authorMayer, Thomas
dc.contributor.authorvan Dorp, Dennis
dc.contributor.authorAbrenica, Graniel
dc.contributor.authorArnauts, Sophia
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-11-30T17:04:50Z
dc.date.available2021-11-30T17:04:50Z
dc.date.issued2021-02
dc.identifier.issnSSP.314.66
dc.identifier.issnna
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38503
dc.titleSurface Chemistry and Nanoscale Wet Etching of Group IV Semiconductors in Acidic H2O2 Solutions
dc.typeProceedings paper
dc.contributor.imecauthorvan Dorp, Dennis
dc.contributor.imecauthorAbrenica, Graniel
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecvan Dorp, Dennis
dc.contributor.orcidimecDe Gendt, Stefan
dc.contributor.orcidimecvan Dorp, Dennis::0000-0002-1085-4232
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.identifier.doihttps://doi.org/10.4028/www.scientific.net/SSP.314.66
dc.identifier.doi10.4028/www.scientific.net/SSP.314.66
dc.source.numberofpages4
dc.source.peerreviewyes
dc.subject.disciplineMaterials science
dc.source.conferenceUCPSS
dc.source.conferencedateApril 2021
dc.source.conferencedateApr-21
dc.source.conferencelocationOnline
dc.source.journalSolid State Phenomena
imec.availabilityPublished - open access


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220.500.12860/38503.22022-06-24T09:34:16Zvalidation by library/open access desk
120.500.12860/38503*2021-11-30T17:04:50Z

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