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Etch process development for FLARE(tm) for dual damascene architecture using a N2/O2 plasma
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Authors
Thompson, Heike
;
Vanhaelemeersch, Serge
;
Maex, Karen
;
Van Ammel, Annemie
;
Beyer, Gerald
;
Coenegrachts, Bart
;
Vervoort, Iwan
;
Waeterloos, Joost
;
Struyf, Herbert
;
Palmans, Roger
;
Forester, Lynn
Conference
Proceedings of the International Interconnect Technology Conference - IITC; San Francisco, CA, USA.
Title
Etch process development for FLARE(tm) for dual damascene architecture using a N2/O2 plasma
Publication type
Proceedings paper
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