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Screening of 193i and EUV lithography process options for STT-MRAM orthogonal array MTJ pillars
Publication:
Screening of 193i and EUV lithography process options for STT-MRAM orthogonal array MTJ pillars
Date
2021
Journal article
https://doi.org/10.1016/j.mne.2021.100082
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5.62 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Pak, Murat
;
Zanders, Wesley
;
Wong, Patrick
;
Halder, Sandip
Journal
MICRO AND NANO ENGINEERING
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1803
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Metrics
Downloads
451
since deposited on 2022-02-22
24
last week
Acq. date: 2025-10-29
Views
1803
since deposited on 2022-02-22
2
last week
Acq. date: 2025-10-29
Citations