Publication:
Extending 0.33NA EUVL to 28 nm pitch using alternative mask and controlled aberrations
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1789 since deposited on 2022-03-11
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Acq. date: 2025-10-25
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Metrics
Views
1789 since deposited on 2022-03-11
423item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations