Extending 0.33NA EUVL to 28 nm pitch using alternative mask and controlled aberrations

Publication:

2021

Proceedings Paper

Author(s)

Rio, D.

;

Van Adrichem, P.

;

Delorme, M.

;

Lyakhova, K.

;

Spence, C.

;

Franke, Joern-Holger

Proceedings of SPIE

1791 since deposited on 2022-03-11

Acq. date: 2026-02-25