EISBN
978-1-5106-4052-8
ISBN
978-1-5106-4051-1
ISSN
0277-786X
Conference
Conference on Extreme Ultraviolet (EUV) Lithography XII
Journal
Proceedings of SPIE
Volume
11609
Title
Extending 0.33NA EUVL to 28 nm pitch using alternative mask and controlled aberrations
Publication type
Proceedings paper