Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
A novel integration scheme for wafer singulation and selective processing using temporary dry film resist
Publication:
A novel integration scheme for wafer singulation and selective processing using temporary dry film resist
Date
2021
Proceedings Paper
https://doi.org/10.1109/ECTC32696.2021.00136
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
La Grappe, Alexandre
;
Visker, Evert
;
Redolfi, Augusto
;
Peng, Lan
;
Muga, Karthik
;
Huls, David
;
Vanhaelemeersch, Serge
;
Lauwers, Anne
;
Ackaert, Jan
Journal
na
Abstract
Description
Metrics
Views
1892
since deposited on 2022-03-16
Acq. date: 2025-10-27
Citations
Metrics
Views
1892
since deposited on 2022-03-16
Acq. date: 2025-10-27
Citations