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Towards high NA patterning readiness: Materials, processes and etch transfer for P24 Line Space
dc.contributor.author | Thiam, A. | |
dc.contributor.author | Santaclara, J. G. | |
dc.contributor.author | Franke, J-H | |
dc.contributor.author | Schleicher, F. | |
dc.contributor.author | Blanc, R. | |
dc.contributor.author | Bezard, P. | |
dc.contributor.author | Moussa, A. | |
dc.contributor.author | Hendrickx, E. | |
dc.contributor.author | Wong, P. | |
dc.contributor.author | Maslow, M. J. | |
dc.date.accessioned | 2022-05-22T02:19:05Z | |
dc.date.available | 2022-05-22T02:19:05Z | |
dc.date.issued | 2021 | |
dc.identifier.isbn | 978-1-5106-4552-3 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000792657300005 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39868 | |
dc.source | WOS | |
dc.title | Towards high NA patterning readiness: Materials, processes and etch transfer for P24 Line Space | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Thiam, A. | |
dc.contributor.imecauthor | Franke, J-H | |
dc.contributor.imecauthor | Schleicher, F. | |
dc.contributor.imecauthor | Blanc, R. | |
dc.contributor.imecauthor | Bezard, P. | |
dc.contributor.imecauthor | Moussa, A. | |
dc.contributor.imecauthor | Hendrickx, E. | |
dc.contributor.imecauthor | Wong, P. | |
dc.identifier.doi | 10.1117/12.2601839 | |
dc.identifier.eisbn | 978-1-5106-4553-0 | |
dc.source.numberofpages | 14 | |
dc.source.peerreview | yes | |
dc.source.conference | International Conference on Extreme Ultraviolet Lithography | |
dc.source.conferencedate | SEP 27-OCT 01, 2021 | |
dc.source.volume | 11854 | |
imec.availability | Under review |
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