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First results of EUV-scanner compatibility tests performed on novel 'high-NA' reticle absorber materials

dc.contributor.authorStortelder, Jetske
dc.contributor.authorEbeling, Robert P.
dc.contributor.authorRijnsent, Corne
dc.contributor.authorvan Putten, Michel
dc.contributor.authorde Rooij-Lohmann, Veronique
dc.contributor.authorSmit, Maximilian
dc.contributor.authorStorm, Arnold J.
dc.contributor.authorKoster, Norbert
dc.contributor.authorLensen, Henk A.
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorOpsomer, Karl
dc.contributor.authorThakare, Devesh
dc.contributor.authorFeigl, Torsten
dc.contributor.authorNaujok, Philipp
dc.date.accessioned2022-05-23T10:52:01Z
dc.date.available2022-05-22T02:19:15Z
dc.date.available2022-05-23T10:52:01Z
dc.date.issued2021
dc.identifier.isbn978-1-5106-4552-3
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000792657300019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39876.2
dc.sourceWOS
dc.titleFirst results of EUV-scanner compatibility tests performed on novel 'high-NA' reticle absorber materials
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorThakare, Devesh
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecThakare, Devesh::0000-0003-3265-7042
dc.identifier.doi10.1117/12.2600928
dc.identifier.eisbn978-1-5106-4553-0
dc.source.numberofpages12
dc.source.peerreviewyes
dc.subject.disciplineMaterials science
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 27-OCT 01, 2021
dc.source.conferencelocationonline
dc.source.journalProceedings of SPIE
dc.source.volume11854
imec.availabilityUnder review


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320.500.12860/39876.32022-06-23T14:17:53Zvalidation by library/open access desk
220.500.12860/39876.2*2022-05-23T10:46:36Zvalidation by imec author
120.500.12860/398762022-05-22T02:19:15Z

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