Browsing Conference contributions by imec author "550802c3d066854218c729863584a9179af13b1b"
Now showing items 1-2 of 2
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EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity
Nagahara, S.; Dinh, C.Q.; Yoshida, Keisuke; Shiraishi, G.; Kondo, Y.; Yoshihara, K.; Nafus, Kathleen; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert; Stock, H.; Meliorisz, B. (2020) -
Impact of local variability on defect-aware process windows
Maslow, Mark John; Yaegashi, Hidetami; Frommhold, Andreas; Schiffelers, Guido; Wahlisch, Felix; Rispens, Gijsbert; Slachter, Bram; Yoshida, Keisuke; Hara, Arisa; Oikawa, Noriaki; Pathak, Abhinav; Cerbu, Dorin; Hendrickx, Eric; Bekaert, Joost (2019)