Browsing Conference contributions by author "Saadeh, Qais"
Now showing items 1-6 of 6
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Evaluation of Ta-Co alloys as novel high-k EUV mask absorber
Thakare, Devesh; Wu, Meiyi; Opsomer, Karl; Detavernier, Christophe; Naujok, Philipp; Saadeh, Qais; Soltwisch, Victor; Delabie, Annelies; Philipsen, Vicky (2022) -
Mask absorber for next generation EUV lithography
Wu, Meiyi; Thakare, Devesh; De Marneffe, Jean-Francois; Jaenen, Patrick; Souriau, Laurent; Opsomer, Karl; Soulie, Jean-Philippe; Erdmann, Andreas; Mesilhy, Hazem; Naujok, Philipp; Foltin, Markus; Soltwisch, Victor; Saadeh, Qais; Philipsen, Vicky (2020) -
Optical constants for EUV scatterometry
Ciesielski, Richard; Saadeh, Qais; Naujok, Philipp; Opsomer, Karl; Soulie, Jean-Philippe; Wu, Meiyi; Philipsen, Vicky; Van de Kruijs, Robbert; Kolbe, Michael; Scholze, Frank; Soltwisch, Victor (2021) -
Precise optical constant determination in the soft X-ray, EUV, and VUV spectral range
Abbasirad, Najmeh; Saadeh, Qais; Ciesielski, Richard; Gottwald, Alexander; Philipsen, Vicky; Makhotkin, Igor; Sokolov, Andrey; Kolbe, Michael; Scholze, Frank; Soltwisch, Victor (2023) -
Precise optical constants: determination and impact on metrology, simulation and development of EUV masks
Saadeh, Qais; Mesilhy, Hazem; Soltwisch, Victor; Erdmann, Andreas; Ciesielski, Richard; Lohr, Leonhard; Andrle, Anna; Philipsen, Vicky; Thakare, Devesh; Laubis, Christian; Scholze, Frank; Kolbe, Michael (2022) -
Simulation of polychromatic effects in high NA EUV lithography
Erdmann, Andreas; Mesilhy, Hazem; Evanschitzky, Peter; Saadeh, Qais; Soltwisch, Victor; Bihr, Simon; Zimmermann, Joerg; Philipsen, Vicky (2021)