Browsing Conference contributions by imec author "626990b55cc52adfaf3abe2149675e2908a5a27c"
Now showing items 1-5 of 5
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CNT EUV pellicle tunability and performance in a scanner-like environment
Timmermans, Marina; Pollentier, Ivan; Korytov, Maxim; Nuytten, Thomas; Sergeant, Stefanie; Conard, Thierry; Meersschaut, Johan; Zhang, Yide; Dialameh, Masoud; Alaerts, Wilfried; Jazaeri, Ehsan; Spampinato, Valentina; Franquet, Alexis; Brems, Steven; Huyghebaert, Cedric; Gallagher, Emily (2021) -
Dry etch challenges in a 20 nm half-pitch single damascene spacer-defined patterning scheme
Kunnen, Eddy; Versluijs, Janko; Alaerts, Wilfried; Siew, Yong Kong; Struyf, Herbert; Beyer, Gerald (2010) -
High yield sub-0.1μm² 6T-SRAM Cells, featuring high-k/metal-gate Finfet devices, double gate patterning, a novel Fin etch strategy, full-field EUV lithography and optimized junction design & layout
Horiguchi, Naoto; Demuynck, Steven; Ercken, Monique; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Vandeweyer, Tom; Baerts, Christina; Mannaert, Geert; Truffert, Vincent; Verluijs, j; Alaerts, Wilfried; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Vandenberghe, Geert; Beyer, Gerald; Lauwers, Anne; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2010) -
Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structures
Carbonell, Laure; Volders, Henny; Heylen, Nancy; Kellens, Kristof; Tokei, Zsolt; Hendrickx, Dirk; Struyf, Herbert; Vandervorst, Alain; Claes, Martine; Lux, Marcel; Versluijs, Janko; Alaerts, Wilfried; Van Besien, Els; Deweerdt, Bruno; Vaes, Jan; Caluwaerts, Rudy; Cockburn, Andrew; Gravey, Virginie; Shah, Kavita; Al-Bayati, A.; Fu, X.; Lubben, D.; Sundarrajan, A.; Beyer, Gerald (2008) -
Integration of 20nm half pitch single damascene copper trenches by spacer-defined double patterning (SDDP) on metal hard mask (MHM)
Siew, Yong Kong; Versluijs, Janko; Kunnen, Eddy; Ciofi, Ivan; Alaerts, Wilfried; Dekkers, Harold; Volders, Henny; Suhard, Samuel; Cockburn, Andrew; Sleeckx, Erik; Van Besien, Els; Struyf, Herbert; Maenhoudt, Mireille; Noori, Atif; Padhi, Deenesh; Shah, Kavita; Gravey, Virginie; Beyer, Gerald (2010)