Browsing Conference contributions by imec author "83c6e39a2b4a17633480cf86c9ca752b3dab75e2"
Now showing items 21-26 of 26
-
Strain enhanced FUSI/HfSiON technology with optimized CMOS process window
Veloso, Anabela; Verheyen, Peter; Vos, Rita; Brus, Stephan; Ito, Satoru; Mitsuhashi, Riichirou; Paraschiv, Vasile; Shi, Xiaoping; Onsia, Bart; Arnauts, Sophia; Loo, Roger; Lauwers, Anne; Conard, Thierry; de Marneffe, Jean-Francois; Goossens, Danny; Baute, Debbie; Locorotondo, Sabrina; Chiarella, Thomas; Kerner, Christoph; Vrancken, Christa; Mertens, Sofie; O'Sullivan, Barry; Yu, HongYu; Chang, Shou-Zen; Niwa, Masaaki; Kittl, Jorge; Absil, Philippe; Jurczak, Gosia; Hoffmann, Thomas Y.; Biesemans, Serge (2007) -
Study on the metal deposition behavior on Ge surfaces
Sioncke, Sonja; Onsia, Bart; Struys, K.; Meuris, Marc; Mertens, Paul; Theuwis, A. (2005) -
Surface preparation techniques for high-k deposition on Ge substrates
Van Elshocht, Sven; Delabie, Annelies; Brijs, Bert; Caymax, Matty; Conard, Thierry; Onsia, Bart; Puurunen, Riikka; Richard, Olivier; Van Steenbergen, Jan; Zhao, Chao; Meuris, Marc; Heyns, Marc (2005) -
The future of high-k on pure germanium and its importance for Ge CMOS
Meuris, Marc; Delabie, Annelies; Van Elshocht, Sven; Kubicek, Stefan; Verheyen, Peter; De Jaeger, Brice; Van Steenbergen, Jan; Winderickx, Gillis; Van Moorhem, Els; Purunen, Riikka; Brijs, Bert; Caymax, Matty; Conard, Thierry; Richard, Olivier; Vandervorst, Wilfried; Zhao, Chao; De Gendt, Stefan; Schram, Tom; Chiarella, Thomas; Onsia, Bart; Teerlinck, I; Mertens, Paul; Raskin, G; Mijlemans, P; Biesemans, Serge; Heyns, Marc (2004) -
The role of TXRF in the introduction of high-k materials into IC processing
Hellin, David; Onsia, Bart; Delabie, Annelies; De Gendt, Stefan; Vinckier, Chris (2004) -
Vapor phase decomposition - droplet collection. Can we improve the collection efficiency for copper contamination?
De Gendt, Stefan; Huber, A.; Onsia, Bart; Arnauts, Sophia; Kenis, Karine; Knotter, D. M.; Mertens, Paul; Heyns, Marc (1999)