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Deep electron traps in HfO2-based ferroelectrics: (Al/Si-doped) HfO2 versus HfZrO4
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Authors
Izmailov, R. A.
;
O'Sullivan, Barry
;
Popovici, Mihaela Ioana
;
Afanas'ev, V. V.
DOI
10.1016/j.sse.2022.108388
ISSN
0038-1101
Issue
na
Journal
SOLID-STATE ELECTRONICS
Volume
194
Title
Deep electron traps in HfO2-based ferroelectrics: (Al/Si-doped) HfO2 versus HfZrO4
Publication type
Journal article
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2
20.500.12860/40003.2
*
2022-09-01T14:18:45Z
validation by library/open access desk
1
20.500.12860/40003
2022-06-23T02:25:39Z
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