dc.contributor.author | Gupta, Anshul | |
dc.contributor.author | Tao, Zheng | |
dc.contributor.author | Radisic, Dunja | |
dc.contributor.author | Mertens, Hans | |
dc.contributor.author | Varela Pedreira, Olalla | |
dc.contributor.author | Demuynck, Steven | |
dc.contributor.author | Boemmels, Juergen | |
dc.contributor.author | Devriendt, Katia | |
dc.contributor.author | Heylen, Nancy | |
dc.contributor.author | Wang, Shouhua | |
dc.contributor.author | Kenis, Karine | |
dc.contributor.author | Teugels, Lieve | |
dc.contributor.author | Sebaai, Farid | |
dc.contributor.author | Lorant, Christophe | |
dc.contributor.author | Jourdan, Nicolas | |
dc.contributor.author | Chan, BT | |
dc.contributor.author | Subramanian, Sujith | |
dc.contributor.author | Schleicher, Filip | |
dc.contributor.author | Peter, Antony | |
dc.contributor.author | Rassoul, Nouredine | |
dc.contributor.author | Siew, Yong Kong | |
dc.contributor.author | Briggs, Basoene | |
dc.contributor.author | Zhou, Daisy | |
dc.contributor.author | Rosseel, Erik | |
dc.contributor.author | Capogreco, Elena | |
dc.contributor.author | Mannaert, Geert | |
dc.contributor.author | Sepulveda Marquez, Alfonso | |
dc.contributor.author | Dupuy, Emmanuel | |
dc.contributor.author | Vandersmissen, Kevin | |
dc.contributor.author | Chehab, Bilal | |
dc.contributor.author | Murdoch, Gayle | |
dc.contributor.author | Altamirano Sanchez, Efrain | |
dc.contributor.author | Biesemans, Serge | |
dc.contributor.author | Tokei, Zsolt | |
dc.contributor.author | Dentoni Litta, Eugenio | |
dc.contributor.author | Horiguchi, Naoto | |
dc.date.accessioned | 2023-04-26T08:46:58Z | |
dc.date.available | 2022-09-08T02:38:37Z | |
dc.date.available | 2023-04-26T08:46:58Z | |
dc.date.issued | 2022 | |
dc.identifier.isbn | 978-1-5106-4987-3 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000844514700010 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40366.2 | |
dc.source | WOS | |
dc.title | Buried Power Rail Integration for CMOS Scaling beyond the 3 nm Node | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Gupta, Anshul | |
dc.contributor.imecauthor | Tao, Zheng | |
dc.contributor.imecauthor | Radisic, Dunja | |
dc.contributor.imecauthor | Mertens, Hans | |
dc.contributor.imecauthor | Varela Pedreira, Olalla | |
dc.contributor.imecauthor | Demuynck, Steven | |
dc.contributor.imecauthor | Boemmels, Juergen | |
dc.contributor.imecauthor | Devriendt, Katia | |
dc.contributor.imecauthor | Heylen, Nancy | |
dc.contributor.imecauthor | Wang, Shouhua | |
dc.contributor.imecauthor | Kenis, Karine | |
dc.contributor.imecauthor | Teugels, Lieve | |
dc.contributor.imecauthor | Sebaai, Farid | |
dc.contributor.imecauthor | Lorant, Christophe | |
dc.contributor.imecauthor | Jourdan, Nicolas | |
dc.contributor.imecauthor | Chan, BT | |
dc.contributor.imecauthor | Subramanian, Sujith | |
dc.contributor.imecauthor | Schleicher, Filip | |
dc.contributor.imecauthor | Peter, Antony | |
dc.contributor.imecauthor | Rassoul, Nouredine | |
dc.contributor.imecauthor | Siew, Yong Kong | |
dc.contributor.imecauthor | Briggs, Basoene | |
dc.contributor.imecauthor | Zhou, Daisy | |
dc.contributor.imecauthor | Rosseel, Erik | |
dc.contributor.imecauthor | Capogreco, Elena | |
dc.contributor.imecauthor | Mannaert, Geert | |
dc.contributor.imecauthor | Sepulveda Marquez, Alfonso | |
dc.contributor.imecauthor | Dupuy, Emmanuel | |
dc.contributor.imecauthor | Vandersmissen, Kevin | |
dc.contributor.imecauthor | Chehab, Bilal | |
dc.contributor.imecauthor | Murdoch, Gayle | |
dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
dc.contributor.imecauthor | Biesemans, Serge | |
dc.contributor.imecauthor | Tokei, Zsolt | |
dc.contributor.imecauthor | Dentoni Litta, Eugenio | |
dc.contributor.imecauthor | Horiguchi, Naoto | |
dc.contributor.orcidimec | Varela Pedreira, Olalla::0000-0002-2987-1972 | |
dc.contributor.orcidimec | Boemmels, Juergen::0000-0002-8761-5213 | |
dc.contributor.orcidimec | Devriendt, Katia::0000-0002-0662-7926 | |
dc.contributor.orcidimec | Wang, Shouhua::0000-0002-9105-8552 | |
dc.contributor.orcidimec | Teugels, Lieve::0000-0002-6613-9414 | |
dc.contributor.orcidimec | Lorant, Christophe::0000-0001-7363-9348 | |
dc.contributor.orcidimec | Chan, BT::0000-0003-2890-0388 | |
dc.contributor.orcidimec | Subramanian, Sujith::0000-0001-8938-9750 | |
dc.contributor.orcidimec | Schleicher, Filip::0000-0003-3630-7285 | |
dc.contributor.orcidimec | Peter, Antony::0000-0001-5941-0563 | |
dc.contributor.orcidimec | Rassoul, Nouredine::0000-0001-9489-3396 | |
dc.contributor.orcidimec | Sepulveda Marquez, Alfonso::0000-0003-4726-177X | |
dc.contributor.orcidimec | Dupuy, Emmanuel::0000-0003-3341-1618 | |
dc.contributor.orcidimec | Altamirano Sanchez, Efrain::0000-0003-3235-6055 | |
dc.contributor.orcidimec | Dentoni Litta, Eugenio::0000-0003-0333-376X | |
dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
dc.identifier.doi | 10.1117/12.2615641 | |
dc.identifier.eisbn | 978-1-5106-4988-0 | |
dc.source.numberofpages | 5 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 120560B | |
dc.source.conference | Conference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference | |
dc.source.conferencedate | APR 24-MAY 27, 2020-2022 | |
dc.source.conferencelocation | San Jose | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 12056 | |
imec.availability | Published - imec | |