dc.contributor.author | Pollentier, Ivan | |
dc.contributor.author | Rathore, Ashish | |
dc.contributor.author | Gupta, Mihir | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Suh, Hyo Seon | |
dc.date.accessioned | 2023-06-14T09:30:02Z | |
dc.date.available | 2022-09-08T02:38:38Z | |
dc.date.available | 2022-11-07T08:06:23Z | |
dc.date.available | 2022-11-25T09:21:47Z | |
dc.date.available | 2023-06-14T09:30:02Z | |
dc.date.issued | 2022-05-25 | |
dc.identifier.isbn | 978-1-5106-4985-9 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000844546500006 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40368.4 | |
dc.source | WOS | |
dc.title | To bake or not to bake... : the role of prebake in the EUV resist process | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Pollentier, Ivan | |
dc.contributor.imecauthor | Rathore, Ashish | |
dc.contributor.imecauthor | Gupta, Mihir | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Suh, Hyo Seon | |
dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
dc.contributor.orcidimec | Gupta, Mihir::0000-0003-0286-7997 | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.date.embargo | 2022-05-31 | |
dc.identifier.doi | 10.1117/12.2616094 | |
dc.identifier.eisbn | 978-1-5106-4986-6 | |
dc.source.numberofpages | 7 | |
dc.source.peerreview | yes | |
dc.subject.discipline | Electrical & electronic engineering | |
dc.source.beginpage | 1205507 | |
dc.source.conference | Conference on Advances in Patterning Materials and Processes XXXIX Part of SPIE Advanced Lithography and Patterning Conference | |
dc.source.conferencedate | APR 24-MAY 27, 2022 | |
dc.source.conferencelocation | San Jose | |
dc.source.journal | Advances in Patterning Materials and Processes XXXIX | |
dc.source.volume | 12055 | |
imec.availability | Published - open access | |