EUV resist performance enhancement by UV flood exposure for high NA EUV lithography

Cong Que Dinh; Nagahara, Seiji; Yoshida, Keisuke; Kondo, Yoshihiro; Muramatsu, Makoto; Yoshihara, Kosuke; Shimada, Ryo; Moriya, Teruhiko; Nafus, Kathleen; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert

doi:10.1117/12.2583922

Publication:

EUV resist performance enhancement by UV flood exposure for high NA EUV lithography

Date

2021

Proceedings Paper

https://doi.org/10.1117/12.2583922

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Cong Que Dinh

;

Nagahara, Seiji

;

Yoshida, Keisuke

;

Kondo, Yoshihiro

;

Muramatsu, Makoto

;

Yoshihara, Kosuke

;

Shimada, Ryo

;

Moriya, Teruhiko

;

Nafus, Kathleen

;

;

;

;

Journal

Proceedings of SPIE

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1349 since deposited on 2022-09-08

Acq. date: 2026-02-28

EUV resist performance enhancement by UV flood exposure for high NA EUV lithography

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