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dc.contributor.authorTan, Ling Ee
dc.contributor.authorGillijns, Werner
dc.contributor.authorLee, Jae Uk
dc.contributor.authorXu, Dongbo
dc.contributor.authorVan de Kerkhove, Jeroen
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorKim, Ryoung-han
dc.date.accessioned2022-09-26T09:29:16Z
dc.date.available2022-09-19T02:51:15Z
dc.date.available2022-09-26T09:29:16Z
dc.date.issued2022-05-26
dc.identifier.isbn978-1-5106-4977-4
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000850450900022
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40459.2
dc.sourceWOS
dc.titleEUV low-n attenuated phase-shift mask on random logic Via single patterning at pitch 36nm
dc.typeProceedings paper
dc.contributor.imecauthorTan, Ling Ee
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorLee, Jae Uk
dc.contributor.imecauthorXu, Dongbo
dc.contributor.imecauthorVan de Kerkhove, Jeroen
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorKim, Ryoung-han
dc.contributor.orcidimecTan, Ling Ee::0000-0002-3143-5176
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecLee, Jae Uk::0000-0002-9434-5055
dc.contributor.orcidimecXu, Dongbo::0000-0003-1159-2315
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.identifier.doi10.1117/12.2614000
dc.identifier.eisbn978-1-5106-4978-1
dc.source.numberofpages18
dc.source.peerreviewno
dc.source.conferenceConference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference
dc.source.conferencedateAPR 24-MAY 27, 2022
dc.source.conferencelocationSan Jose, California, United States
dc.source.journalSPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States
dc.source.volume12051
imec.availabilityUnder review


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