Notice
This item has not yet been validated by imec staff.
Notice
This is not the latest version of this item. The latest version can be found at: https://imec-publications.be/handle/20.500.12860/40460.3
Investigation of Low-n Mask in 0.33NA EUV Single Patterning at Pitch 28nm Metal Design
dc.contributor.author | Xu, Dongbo | |
dc.contributor.author | Gillijns, Werner | |
dc.contributor.author | Tan, Ling Ee | |
dc.contributor.author | Philipsen, Vicky | |
dc.contributor.author | Kim, Ryoung-han | |
dc.date.accessioned | 2022-09-19T02:51:15Z | |
dc.date.available | 2022-09-19T02:51:15Z | |
dc.date.issued | 2022 | |
dc.identifier.isbn | 978-1-5106-4977-4 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000850450900015 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40460 | |
dc.source | WOS | |
dc.title | Investigation of Low-n Mask in 0.33NA EUV Single Patterning at Pitch 28nm Metal Design | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Xu, Dongbo | |
dc.contributor.imecauthor | Gillijns, Werner | |
dc.contributor.imecauthor | Tan, Ling Ee | |
dc.contributor.imecauthor | Philipsen, Vicky | |
dc.contributor.imecauthor | Kim, Ryoung-han | |
dc.contributor.orcidimec | Xu, Dongbo::0000-0003-1159-2315 | |
dc.contributor.orcidimec | Gillijns, Werner::0000-0002-2430-7360 | |
dc.contributor.orcidimec | Tan, Ling Ee::0000-0002-3143-5176 | |
dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
dc.identifier.doi | 10.1117/12.2614197 | |
dc.identifier.eisbn | 978-1-5106-4978-1 | |
dc.source.numberofpages | 13 | |
dc.source.peerreview | yes | |
dc.source.conference | Conference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference | |
dc.source.conferencedate | APR 24-MAY 27, 2022 | |
dc.source.volume | 12051 | |
imec.availability | Under review |
Files in this item
Files | Size | Format | View |
---|---|---|---|
There are no files associated with this item. |