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dc.contributor.authorHiblot, Gaspard
dc.contributor.authorSerbulova, Kateryna
dc.contributor.authorHellings, Geert
dc.contributor.authorChen, Shih-Hung
dc.date.accessioned2022-09-25T02:51:36Z
dc.date.available2022-09-25T02:51:36Z
dc.date.issued2021
dc.identifier.issn1545-827X
dc.identifier.otherWOS:000853482700023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40509
dc.sourceWOS
dc.titleTCAD study of latch-up sensitivity to wafer thinning below 500 nm
dc.typeProceedings paper
dc.contributor.imecauthorHiblot, Gaspard
dc.contributor.imecauthorSerbulova, Kateryna
dc.contributor.imecauthorHellings, Geert
dc.contributor.imecauthorChen, Shih-Hung
dc.contributor.orcidimecHiblot, Gaspard::0000-0002-3869-965X
dc.contributor.orcidimecSerbulova, Kateryna::0000-0001-7326-9949
dc.contributor.orcidimecHellings, Geert::0000-0002-5376-2119
dc.contributor.orcidimecChen, Shih-Hung::0000-0002-6481-2951
dc.identifier.doi10.1109/CAS52836.2021.9604133
dc.identifier.eisbn978-1-6654-3571-0
dc.source.numberofpages4
dc.source.peerreviewyes
dc.source.beginpage121
dc.source.endpage124
dc.source.conference44th International Semiconductor Conference (CAS)
dc.source.conferencedateOCT 06-08, 2021
imec.availabilityUnder review


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