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TCAD study of latch-up sensitivity to wafer thinning below 500 nm
dc.contributor.author | Hiblot, Gaspard | |
dc.contributor.author | Serbulova, Kateryna | |
dc.contributor.author | Hellings, Geert | |
dc.contributor.author | Chen, Shih-Hung | |
dc.date.accessioned | 2022-09-25T02:51:36Z | |
dc.date.available | 2022-09-25T02:51:36Z | |
dc.date.issued | 2021 | |
dc.identifier.issn | 1545-827X | |
dc.identifier.other | WOS:000853482700023 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40509 | |
dc.source | WOS | |
dc.title | TCAD study of latch-up sensitivity to wafer thinning below 500 nm | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Hiblot, Gaspard | |
dc.contributor.imecauthor | Serbulova, Kateryna | |
dc.contributor.imecauthor | Hellings, Geert | |
dc.contributor.imecauthor | Chen, Shih-Hung | |
dc.contributor.orcidimec | Hiblot, Gaspard::0000-0002-3869-965X | |
dc.contributor.orcidimec | Serbulova, Kateryna::0000-0001-7326-9949 | |
dc.contributor.orcidimec | Hellings, Geert::0000-0002-5376-2119 | |
dc.contributor.orcidimec | Chen, Shih-Hung::0000-0002-6481-2951 | |
dc.identifier.doi | 10.1109/CAS52836.2021.9604133 | |
dc.identifier.eisbn | 978-1-6654-3571-0 | |
dc.source.numberofpages | 4 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 121 | |
dc.source.endpage | 124 | |
dc.source.conference | 44th International Semiconductor Conference (CAS) | |
dc.source.conferencedate | OCT 06-08, 2021 | |
imec.availability | Under review |
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