Cluster formation during annealing of ultra-low-energy boron-implanted silicon

Collart, E. J. H.; Murrell, A. J.; Foad, M. A.; van den Berg, J. A.; Zhang, S.; Armour, D.; Goldberg, R. D.; Wang, T. S.; Cullis, A. G.; Clarysse, Trudo; Vandervorst, Wilfried

Publication:

Cluster formation during annealing of ultra-low-energy boron-implanted silicon

Date

2000

Journal article

Simple item page Full metadata Statistics

Files

4187.pdf 272.76 KB

Author(s)

;

;

;

;

;

;

;

;

;

;

Vandervorst, Wilfried

Journal

J. Vacuum Science and Technology B

Statistics

1898 since deposited on 2021-10-14

2last month

Acq. date: 2026-04-16

Cluster formation during annealing of ultra-low-energy boron-implanted silicon

Date

Files

Author(s)

Journal

Abstract

Description

Statistics

Views

Citations

Statistics

Views

Citations