Publication:

Cluster formation during annealing of ultra-low-energy boron-implanted silicon

Date

2000
Journal article
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Author(s)

Collart, E. J. H.
;
Murrell, A. J.
;
Foad, M. A.
;
van den Berg, J. A.
;
Zhang, S.
;
Armour, D.
;
Goldberg, R. D.
;
Wang, T. S.
;
Cullis, A. G.
;
Clarysse, Trudo
;
Vandervorst, Wilfried  

Journal

J. Vacuum Science and Technology B

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1896 since deposited on 2021-10-14
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Acq. date: 2026-01-11

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