Show simple item record

BEOL N2: M2 through SAxP process from MP21 to MP26: 193i SAQP vs EUV SADP

dc.contributor.authorHermans, Yannick
dc.contributor.authorWu, Chen
dc.contributor.authorBuccheri, Nunzio
dc.contributor.authorSchleicher, Filip
dc.contributor.authorVersluijs, Janko
dc.contributor.authorMontero Alvarez, Daniel
dc.contributor.authorDey, Bappaditya
dc.contributor.authorWong, Patrick
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorPark, Seongho
dc.contributor.authorTokei, Zsolt
dc.contributor.authorLeray, Philippe
dc.contributor.authorHalder, Sandip
dc.date.accessioned2024-05-16T11:47:29Z
dc.date.available2023-06-26T09:47:15Z
dc.date.available2024-05-16T11:47:29Z
dc.date.issued2023-04-28
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42095.2
dc.titleBEOL N2: M2 through SAxP process from MP21 to MP26: 193i SAQP vs EUV SADP
dc.typeProceedings paper
dc.contributor.imecauthorHermans, Yannick
dc.contributor.imecauthorWu, Chen
dc.contributor.imecauthorBuccheri, Nunzio
dc.contributor.imecauthorSchleicher, Filip
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorMontero Alvarez, Daniel
dc.contributor.imecauthorDey, Bappaditya
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorPark, Seongho
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorHalder, Sandip
dc.contributor.orcidimecHermans, Yannick::0000-0002-6973-0795
dc.contributor.orcidimecDey, Bappaditya::0000-0002-0886-137X
dc.contributor.orcidimecMontero Alvarez, Daniel::0000-0001-9966-0399
dc.contributor.orcidimecSchleicher, Filip::0000-0003-3630-7285
dc.contributor.orcidimecWu, Chen::0000-0002-4636-8842
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.contributor.orcidimecLeray, Philippe::0000-0002-1086-270X
dc.contributor.orcidimecTokei, Zsolt::0000-0003-3545-3424
dc.date.embargo2023-03-03
dc.source.numberofpages7
dc.source.peerreviewno
dc.source.conferenceConference on Optical and EUV Nanolithography XXXVI Part of SPIE Advanced Lithography and Patterning Conference
dc.source.conferencedate23/02/2023
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
1249414.pdf
Size:
1.294Mb
Format:
PDF
Description:
Published version
View/open

This item appears in the following collection(s)

Show simple item record

Version history

VersionItemDateSummary
220.500.12860/42095.2*2024-05-16T11:45:55Zvalidation by library/open access desk
120.500.12860/420952023-06-26T09:47:15Z

*Selected version