Toggle navigation
My submissions
Login
Toggle navigation
View item
imec Publications Repository
imec Publications
Conference contributions
View item
imec Publications Repository
imec Publications
Conference contributions
View item
JavaScript is disabled for your browser. Some features of this site may not work without it.
BEOL N2: M2 through SAxP process from MP21 to MP26: 193i SAQP vs EUV SADP
View/
open
Accepted version (1.285Mb)
Metadata
Show full item record
Authors
Hermans, Yannick
;
Wu, Chen
;
Buccheri, Nunzio
;
Schleicher, Filip
;
Versluijs, Janko
;
Montero Alvarez, Daniel
;
Dey, Bappaditya
;
Wong, Patrick
;
Rincon Delgadillo, Paulina
;
Park, Seongho
;
Tokei, Zsolt
;
Leray, Philippe
;
Halder, Sandip
ISSN
0277-786X
Conference
Conference on Optical and EUV Nanolithography XXXVI Part of SPIE Advanced Lithography and Patterning Conference
Journal
Proceedings of SPIE
Title
BEOL N2: M2 through SAxP process from MP21 to MP26: 193i SAQP vs EUV SADP
Publication type
Proceedings paper
Embargo date
2023-03-02
Collections
Conference contributions
Version history
Version
Item
Date
Summary
2
20.500.12860/42095.2
*
2024-05-16T11:45:55Z
validation by library/open access desk
1
20.500.12860/42095
2023-06-26T09:47:15Z
*Selected version
Search imec Publications Repository
This collection
Browse
All of imec Publications Repository
Collections
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
This collection
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
My account
login