Publication:

Impact of gate stack processing on the hysteresis of 300 mm integrated WS2 FETs

Date

2023

Proceedings Paper

https://doi.org/10.1109/IRPS48203.2023.10117803

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Author(s)

Panarella, Luca

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Tyaginov, Stanislav

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Asselberghs, Inge

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Lockhart de la Rosa, Cesar Javier

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Kar, Gouri Sankar

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Afanasiev, Valeri

Journal

na

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1043 since deposited on 2023-07-15

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Acq. date: 2026-04-06