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Study reactive ion etching- transformer coupled plasma (RIE-TCP) mode for patterning of MgZnO alloys, used for computing and memory applications

dc.contributor.authorGhorbani, Leila
dc.contributor.authorKundu, Shreya
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2025-06-19T08:38:08Z
dc.date.available2023-09-15T18:41:07Z
dc.date.available2025-06-19T08:38:08Z
dc.date.issued2023-09-25
dc.identifier.issnN/A
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42549.2
dc.titleStudy reactive ion etching- transformer coupled plasma (RIE-TCP) mode for patterning of MgZnO alloys, used for computing and memory applications
dc.typeMeeting abstract
dc.contributor.imecauthorGhorbani, Leila
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo2023-03-31
dc.identifier.doi10.1145/3568162.3578633
dc.source.numberofpages2
dc.source.peerreviewyes
dc.source.conferenceMNE2023
dc.source.conferencedate26-28 September 2023
dc.source.conferencelocationBerlin
dc.source.journalN/A
imec.availabilityPublished - open access


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220.500.12860/42549.2*2025-06-19T08:31:43Zvalidation by library/open access desk
120.500.12860/425492023-09-15T18:41:07Z

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