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EUV single exposure Tip-to-Tip variability control through PEB process optimization in BEOL layers

dc.contributor.authorRoy, Syamashree
dc.contributor.authorCaron, Elke
dc.contributor.authorSantos, Andreia
dc.contributor.authorFranke, Joern-Holger
dc.contributor.authorVandereyken, Jelle
dc.contributor.authorHalder, Sandip
dc.date.accessioned2024-02-05T13:34:34Z
dc.date.available2024-01-13T17:47:51Z
dc.date.available2024-02-05T13:34:34Z
dc.date.issued2023
dc.identifier.isbn978-1-5106-6748-8
dc.identifier.issn0277-786X
dc.identifier.otherWOS:001125089900024
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43408.2
dc.sourceWOS
dc.titleEUV single exposure Tip-to-Tip variability control through PEB process optimization in BEOL layers
dc.typeProceedings paper
dc.contributor.imecauthorRoy, Syamashree
dc.contributor.imecauthorFranke, Joern-Holger
dc.contributor.imecauthorVandereyken, Jelle
dc.contributor.imecauthorHalder, Sandip
dc.contributor.orcidimecRoy, Syamashree::0009-0009-3247-3252
dc.contributor.orcidimecFranke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimecVandereyken, Jelle::0009-0005-9495-4431
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.identifier.doi10.1117/12.2687558
dc.identifier.eisbn978-1-5106-6749-5
dc.source.numberofpages8
dc.source.peerreviewyes
dc.source.beginpageArt. 127500P
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateOCT 02-05, 2023
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.volume12750
imec.availabilityPublished - imec


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220.500.12860/43408.2*2024-02-05T13:32:12Zvalidation by library/open access desk
120.500.12860/434082024-01-13T17:47:51Z

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