Publication:
Predictive and prospective calibrated TCAD to improve device performances in sub-20 nm gate length p-FinFETs
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112 since deposited on 2024-04-05
1last month
Acq. date: 2026-01-07
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Views
112 since deposited on 2024-04-05
1last month
Acq. date: 2026-01-07
Citations