Publication:

Mask innovations on the eve of high NA EUV lithography

Date

2024
Journal Article Review
https://doi.org/10.35848/1347-4065/ad38c7
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Author(s)

Philipsen, Vicky  
;
Frommhold, Andreas  
;
Thakare, Devesh  
;
Libeert, Guillaume  
;
Lee, Inhwan  
;
Franke, Joern-Holger
;
Bekaert, Joost  
;
Van Look, Lieve  
;
Pellens, Nick  
;
De Bisschop, Peter  
;
Jonckheere, Rik  
;
Kovalevich, Tatiana  
;
Wiaux, Vincent  
;
Hendrickx, Eric  

Journal

JAPANESE JOURNAL OF APPLIED PHYSICS

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110 since deposited on 2024-04-25
1last month
Acq. date: 2026-01-08

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