Studies on resolution with ZEP530A for EUV mask
dc.contributor.author | Akihide, Shirotori | |
dc.contributor.author | Tsutsumi, Takashi | |
dc.contributor.author | Yeh, Sin Fu | |
dc.contributor.author | Kuroyanagi, Kenji | |
dc.date.accessioned | 2024-08-20T08:23:05Z | |
dc.date.available | 2024-06-06T18:30:27Z | |
dc.date.available | 2024-08-20T08:23:05Z | |
dc.date.issued | 2024 | |
dc.identifier.isbn | 978-1-5106-7218-5 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:001222851800027 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/43994.2 | |
dc.source | WOS | |
dc.title | Studies on resolution with ZEP530A for EUV mask | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Yeh, Sin Fu | |
dc.contributor.imecauthor | Akihide, Shirotori | |
dc.date.embargo | 2024-04-09 | |
dc.identifier.doi | 10.1117/12.3010109 | |
dc.identifier.eisbn | 978-1-5106-7219-2 | |
dc.source.numberofpages | 9 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 129560U | |
dc.source.conference | Conference on Novel Patterning Technologies | |
dc.source.conferencedate | FEB 26-29, 2024 | |
dc.source.conferencelocation | San Jose | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 12956 | |
imec.availability | Published - open access |