Publication:

Extreme UV Self-Aligned Double Patterning process optimization for BEOL interconnections on 3nm nodes and beyond

Date

2024
Proceedings Paper
https://doi.org/10.1117/12.3010454
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Author(s)

Montero Alvarez, Daniel  
;
Buccheri, Nunzio  
;
Lin, Quyang  
;
Roy, Syamashree  
;
Paolillo, Sara  
;
Wu, Chen  
;
Hermans, Yannick  
;
Decoster, Stefan  
;
Baudemprez, Bart  
;
Finoulst, Jan-Frederik  
;
Lazzarino, Frederic  
;
Park, Seongho  
;
Tokei, Zsolt  

Journal

Proceedings of SPIE

Abstract

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296 since deposited on 2024-06-06
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296 since deposited on 2024-06-06
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Acq. date: 2026-02-25

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