Publication:
Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms
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225 since deposited on 2024-08-05
37last month
5last week
Acq. date: 2026-01-09
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625 since deposited on 2024-08-05
1last month
Acq. date: 2026-01-09
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