Publication:
Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms
Loading...
Journal
Abstract
Description
Statistics
Downloads
495 since deposited on 2024-08-05
33last month
3last week
Acq. date: 2026-09-11
Views
632 since deposited on 2024-08-05
Acq. date: 2026-09-11
Citations
Statistics
Downloads
495 since deposited on 2024-08-05
33last month
3last week
Acq. date: 2026-09-11
Views
632 since deposited on 2024-08-05
Acq. date: 2026-09-11
Citations