Publication:
Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms
Loading...
Journal
Abstract
Description
Statistics
Downloads
522 since deposited on 2024-08-05
30last month
13last week
Acq. date: 2026-10-06
Views
633 since deposited on 2024-08-05
1last month
Acq. date: 2026-10-06
Citations
Statistics
Downloads
522 since deposited on 2024-08-05
30last month
13last week
Acq. date: 2026-10-06
Views
633 since deposited on 2024-08-05
1last month
Acq. date: 2026-10-06
Citations