Publication:
Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms
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Acq. date: 2026-02-26
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286 since deposited on 2024-08-05
36last month
7last week
Acq. date: 2026-02-26
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626 since deposited on 2024-08-05
Acq. date: 2026-02-26
Citations