Publication:
Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms
Loading...
Journal
Abstract
Description
Metrics
Downloads
195 since deposited on 2024-08-05
53last month
14last week
Acq. date: 2025-12-14
Views
624 since deposited on 2024-08-05
Acq. date: 2025-12-14
Citations
Metrics
Downloads
195 since deposited on 2024-08-05
53last month
14last week
Acq. date: 2025-12-14
Views
624 since deposited on 2024-08-05
Acq. date: 2025-12-14
Citations