Publication:

Gate oxide reliability: upcoming trends, challenges, and opportunities

Date

2024
Proceedings Paper
https://doi.org/10.1109/SNW63608.2024.10639245
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Author(s)

Kaczer, Ben  
;
Degraeve, Robin  
;
Franco, Jacopo  
;
Grasser, T.
;
Roussel, Philippe  
;
Bury, Erik  
;
Weckx, Pieter  
;
Vaisman Chasin, Adrian  
;
Tyaginov, Stanislav  
;
Vandemaele, Michiel  
;
Grill, Alexander  
;
O'Sullivan, Barry  
;
Diaz Fortuny, Javier  
;
Saraza Canflanca, Pablo  
;
Waltl, M.
;
Rinaudo, Pietro  
;
Zhao, Ying  
;
Kao, Ethan  
;
Asanovski, Ruben  
;
Catapano, Edoardo  
;
Beckers, Arnout  
;
Vici, Andrea  
;
Truijen, Brecht  
;
Higashi, Yusuke  
;
Clima, Sergiu  
;
Xiang, Yang  
;
Sangani, Dishant  
;
Panarella, Luca  
;
Smets, Quentin  
;
Knobloch, T.
;
Waldhoer, D.
;
Van Troeye, Benoit  
;
Guo, Yuanyang  
;
Kruv, Anastasiia  
;
Viswakarma, K.
;
Gonzalez, Mario  
;
Linten, Dimitri  

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Abstract

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351 since deposited on 2024-10-27
Acq. date: 2026-01-09

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351 since deposited on 2024-10-27
Acq. date: 2026-01-09

Citations