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Articles
A Comprehensive Microstructure-Aware Electromigration Modeling Framework; Investigation of the Impact of Trench Dimensions in Damascene Copper Interconnects
Publication:
A Comprehensive Microstructure-Aware Electromigration Modeling Framework; Investigation of the Impact of Trench Dimensions in Damascene Copper Interconnects
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Date
2024
Journal article
https://doi.org/10.3390/nano14221834
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Saleh, Ahmed
;
Croes, Kristof
;
Ceric, Hajdin
;
De Wolf, Ingrid
;
Zahedmanesh, Houman
Journal
NANOMATERIALS
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154
since deposited on 2024-12-06
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Acq. date: 2025-12-18
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Downloads
140
since deposited on 2024-12-06
43
last month
11
last week
Acq. date: 2025-12-18
Views
154
since deposited on 2024-12-06
1
last month
Acq. date: 2025-12-18
Citations