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The impact of electric field strength on the accuracy of boron dopant quantification in silicon using atom probe tomography (vol 266,114034,2024)
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The impact of electric field strength on the accuracy of boron dopant quantification in silicon using atom probe tomography (vol 266,114034,2024)
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Date
2025-MAY
Journal Article Correction
https://doi.org/10.1016/j.ultramic.2025.114115
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Guerguis, Bavley
;
Cuduvally, Ramya
;
Morris, Richard J. H.
;
Arcuri, Gabriel
;
Langelier, Brian
;
Bassim, Nabil
Journal
ULTRAMICROSCOPY
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157
since deposited on 2025-04-01
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last month
Acq. date: 2026-01-11
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Metrics
Views
157
since deposited on 2025-04-01
2
last month
Acq. date: 2026-01-11
Citations