Publication:

PFAS-free EUV rinse for advanced technology nodes

Date

2024
Proceedings Paper
https://doi.org/10.1117/12.3034706
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Author(s)

Fallica, Roberto  
;
Heo, Seonggil  
;
Suh, Hyo Seon  
;
De Simone, Danilo  

Journal

Proceedings of SPIE

Abstract

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139 since deposited on 2025-05-11
4last month
Acq. date: 2026-10-12

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