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Enabling 0.33NA EUV lithography patterning towards MP16 SADP semi-damascene metallization, setting the benchmark for High-NA EUV

dc.contributor.authorHermans, Yannick
dc.contributor.authorDecoster, Stefan
dc.contributor.authorWu, Chen
dc.contributor.authorDoise, Jan
dc.contributor.authorRenaud, Vincent
dc.contributor.authorVan den Heuvel, Dieter
dc.contributor.authorPark, Seongho
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorTokei, Zsolt
dc.date.accessioned2025-06-17T12:28:54Z
dc.date.available2025-05-11T05:43:42Z
dc.date.available2025-06-17T12:28:54Z
dc.date.issued2024
dc.identifier.isbn978-1-5106-8155-2
dc.identifier.issn0277-786X
dc.identifier.otherWOS:001467876500026
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45650.2
dc.sourceWOS
dc.titleEnabling 0.33NA EUV lithography patterning towards MP16 SADP semi-damascene metallization, setting the benchmark for High-NA EUV
dc.typeProceedings paper
dc.contributor.imecauthorHermans, Yannick
dc.contributor.imecauthorDecoster, Stefan
dc.contributor.imecauthorWu, Chen
dc.contributor.imecauthorRenaud, Vincent
dc.contributor.imecauthorVan den Heuvel, Dieter
dc.contributor.imecauthorPark, Seongho
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.orcidimecHermans, Yannick::0000-0002-6973-0795
dc.contributor.orcidimecDecoster, Stefan::0000-0003-1162-9288
dc.contributor.orcidimecWu, Chen::0000-0002-4636-8842
dc.contributor.orcidimecRenaud, Vincent::0009-0009-7686-4474
dc.contributor.orcidimecVan Den Heuvel, Dieter::0009-0008-6879-2178
dc.contributor.orcidimecPark, Seongho::0000-0002-1058-9424
dc.contributor.orcidimecTokei, Zsolt::0000-0003-3545-3424
dc.identifier.doi10.1117/12.3034200
dc.identifier.eisbn978-1-5106-8156-9
dc.source.numberofpages11
dc.source.peerreviewyes
dc.source.conference2024 International Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 30-OCT 03, 2024
dc.source.conferencelocationMonterey
dc.source.journalN/A
dc.source.volume13215
imec.availabilityPublished - imec


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220.500.12860/45650.2*2025-06-17T12:27:14Zvalidation by library/open access desk
120.500.12860/456502025-05-11T05:43:42Z

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