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Process development for a novel low loss and non-PFAS photo imageable dielectric for RF silicon interposer applications
Publication:
Process development for a novel low loss and non-PFAS photo imageable dielectric for RF silicon interposer applications
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Date
2024
Proceedings Paper
https://doi.org/10.1109/3DIC63395.2024.10830178
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Jafarpoorchekab, Hamideh
;
Sun, Xiao
;
Uruena, Angel
;
Sinha, Siddhartha
;
Pinho, Nelson
;
Miller, Andy
;
Collaert, Nadine
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N/A
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147
since deposited on 2025-06-21
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last month
Acq. date: 2025-12-16
Citations
Metrics
Views
147
since deposited on 2025-06-21
1
last month
Acq. date: 2025-12-16
Citations