Publication:

Critical In-Line OCD Metrology for CFET Manufacturing

Date

2025

Proceedings Paper

https://doi.org/10.1117/12.3051718

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Author(s)

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Urbanowicz, Adam Michal

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Bogdanowicz, Janusz

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Melhem, Stephanie

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Siew, Yong Kong

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Basu, Debashish

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Charley, Anne-Laure

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Reifsnider, Jason

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Horiguchi, Naoto

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Leray, Philippe

Journal

Proceedings of SPIE

Metrics

49 since deposited on 2025-07-28

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Acq. date: 2026-01-09