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Optimizing EUV OPC Runtime and Pattern Fidelity in DRAM Manufacturing Using Memory OPC Flow
Publication:
Optimizing EUV OPC Runtime and Pattern Fidelity in DRAM Manufacturing Using Memory OPC Flow
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Date
2025
Proceedings Paper
https://doi.org/10.1117/12.3051007
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Gong, Shu
;
Chen, Sheng Tse
;
Liao, Chun Cheng
;
Huang, Teng Yen
;
Meng, Renyang
;
Yang, Kiho
;
Gillijns, Werner
;
Lin, Hsin-jung
;
Ma, Shou-yuan
;
Tsai, JenHsiang
;
Lin, Ling Chieh
;
Chou, Ryan
;
Burbine, Andrew
;
Pearson, Alex
;
Zhang, Xima
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39
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Acq. date: 2026-01-10
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Metrics
Views
39
since deposited on 2025-07-31
4
last month
1
last week
Acq. date: 2026-01-10
Citations