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Conference contributions
Enhancement of DOF through RET and mask manufacturability in high-NA EUV
Publication:
Enhancement of DOF through RET and mask manufacturability in high-NA EUV
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Date
2025
Proceedings Paper
https://doi.org/10.1117/12.3055034
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hwang, Soobin
;
Gillijns, Werner
;
De Gendt, Stefan
;
Kim, Ryan Ryoung Han
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36
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Acq. date: 2026-01-11
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Views
36
since deposited on 2025-07-31
1
last month
1
last week
Acq. date: 2026-01-11
Citations