Publication:

Innovative design solutions for avoiding at-resolution field stitching in high-NA EUV lithography

Date

2025-04-22
Proceedings Paper
https://doi.org/10.1117/12.3051547
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Author(s)

Miyaguchi, Kenichi  
;
Kim, Ryan Ryoung Han  
;
Oak, Apoorva  
;
Drissi, Youssef  
;
Chang, Chieh-Miao
;
Lee, Jeonghoon  
;
Sherazi, Yasser  
;
Trivkovic, Darko  
;
Liu, Ru-Gun  

Journal

Proceedings of SPIE

Abstract

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46 since deposited on 2025-07-31
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Acq. date: 2026-05-17

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