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Contact hole metrology study: understand the electron beam interaction with photoresist and how to minimize its impact
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Contact hole metrology study: understand the electron beam interaction with photoresist and how to minimize its impact
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Date
2025-APR 1
Journal article
https://doi.org/10.1117/1.JMM.24.2.024004
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Zidan, Mohamed
;
Lorusso, Gian
;
De Simone, Danilo
;
Saib, Mohamed
;
Moussa, Alain
;
Billington, Hans
;
Fallica, Roberto
;
Charley, Anne-Laure
;
De Gendt, Stefan
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
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43
since deposited on 2025-08-03
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last month
4
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Acq. date: 2026-01-09
Citations
Metrics
Views
43
since deposited on 2025-08-03
6
last month
4
last week
Acq. date: 2026-01-09
Citations