Browsing Articles by imec author "73d99862ebb6c4035b714a0f071f816b1b90b83a"
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EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
Dinh, Cong Que; Nagahara, Seiji; Kuwahara, Yuhei; Dauendorffer, Arnaud; Yoshida, Keisuke; Okada, Soichiro; Onitsuka, Tomoya; Kawakami, Shinichiro; Shimura, Satoru; Muramatsu, Makoto; Yoshihara, Kosuke; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert; Huli, Lior; Grzeskowiak, Steven; Krawicz, Alexandra; Bae, Nayoung; Kato, Kanzo; Nafus, Kathleen; Raley, Angelique (2022) -
EUV resist process performance investigations on the NXE 3100 full field scanner
Goethals, Mieke; Foubert, Philippe; Hosokawa, Kohei; Van Roey, Frieda; Niroomand, Ardavan; Van Den Heuvel, Dieter; Pollentier, Ivan (2012) -
Impact of post-litho linewidth roughness smoothing processes on the post-etch patterning result
Foubert, Philippe; Vaglio Pret, Alessandro; Altamirano Sanchez, Efrain; Gronheid, Roel (2011-07) -
Probabilistic process window: a new approach to focus-exposure analysis
Mack, Chris A.; Yannuzzi, Jonathan; Lorusso, Gian; Zidan, Mohamed; De Simone, Danilo; Weldeslassie, Ataklti; Vandenbroeck, Nadia; Foubert, Philippe; Beral, Christophe; Charley, Anne-Laure (2023) -
Progresses and challenges of EUV lithography materials
De Simone, Danilo; Goethals, Mieke; Van Roey, Frieda; Tao, Zheng; Foubert, Philippe; Hendrickx, Eric; Vandenberghe, Geert; Ronse, Kurt (2014) -
Roughness characterization in the frequency domain and linewidth roughness mitigation with post-lithography processes
Vaglio Pret, Alessandro; Gronheid, Roel; Foubert, Philippe (2010-12)