Authors

Donaton, R. A.; Coenegrachts, Bart; Maenhoudt, Mireille; Pollentier, Ivan; Struyf, Herbert; Vanhaelemeersch, Serge; Vos, I.; Meuris, Marc; Fyen, Wim; Beyer, Gerald; Tokei, Zsolt; Stucchi, Michele; Vervoort, Iwan; De Roest, David; Maex, Karen

Issue

1_4

Journal

Microelectronic Engineering

Volume

55

Title

Integration of Cu and low-K dielectrics: effect of hard mask and dry etch on electrical performance of damascene structures

Publication type

Journal article