Authors

Alam, M.A.; Green, Martin; Ho, M.Y.; Vandervorst, Wilfried; Brijs, Bert; Conard, Thierry; Räisänen, P.I.

Conference

MRS Fall Meeting Symposium N: Novel Materials and Processes for Advanced CMOS

Title

A mathematical description of atomic layer deposition (ALD), and its application to the nucleation and growth of HfO2 gate dielectric layers

Publication type

Oral presentation